Field-plated D3MOSFET design for breakdown voltage improvement
نویسندگان
چکیده
As commonly reported in other power devices, the lateral deep-depletion diamond MOSFET (D3MOSFET) suffers from an electric crowding effect at gate-edge toward drain. This behavior leads to a premature breakdown of gate-oxide (made Al2O3) below expected performances material. The current article focuses on design field-plated D3MOSFET order improve device voltage up 1 kV. Based 2D TCAD simulations, field-plate geometrical features are optimized reach targeted specification, with larger than 600 V. improved architecture requires addition passivation layer made Si3N4 that must critical field around 10 MV/cm. Therefore, characterization campaign this is performed based MIM capacitors. Measurements 400 nm thick show promising results between 8 MV/cm and 11
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ژورنال
عنوان ژورنال: Diamond and Related Materials
سال: 2023
ISSN: ['1879-0062', '0925-9635']
DOI: https://doi.org/10.1016/j.diamond.2023.109827